The Laboratory

UPDATE: The 300 kV ThermoFisher Tecnai TEM is online

Features of the microscope

  • Accelerating Voltage 300 kVĀ 
  • Filament: Zirconated Tungsten thermal emission tip
  • Resolution CTEM : 0.1 nm latticeĀ 
  • Resolution STEM : 0.34 nm point-to-point
  • XEDS System: EDXA SDD X-ray detector (active area 30 mm2) for elements with Z>5
  • Gatan camera 2kx2k for 300 kV
  • FEI TIA and Gatan Digital Micrograph
  • High Angle Annual Dark-field detector
  • FEI Low-background large-angle double-tilt holder (+/- 70 deg.)
  • DENS MEMS heating holder (RT-10000C, +/- 30 deg.)
  • Remote operation capability
  • In-situ ion irradiation

Please click here for detailed information.

About MIBL

The Michigan Ion Beam Laboratory (MIBL) for Surface Modification and Analysis was established in October of 1986. The Laboratory is part of the Department of Nuclear Engineering and Radiological Sciences in the College of Engineering, and is located on the University of Michigan’s North Campus. MIBL is part of the National Nanotechnology Infrastructure Network (NNIN). The laboratory was created for the purpose of advancing our understanding of ion-solid interactions by providing unique and extensive facilities to support both research and development in the field. Researchers have available to them several instruments for conducting ion beam surface modification and ion beam surface analysis under a wide range of conditions. Experiments can be conducted at high or low temperature, in ultra-high vacuums, in a reactive gas and in short turnaround times. A knowledgeable scientific staff and a large number of supporting facilities are also available for surface preparation and analysis. Cruise the site and see if anything interests you.